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Dr. Mark Masters
Department of Physics
Indiana University - Purdue University Fort Wayne
The purpose of this research is to explore magnetron metal deposition (MDD) and its effectiveness in coating glass with conductive material. A particular interest in this research is the rate at which the conductive material is deposited on the glass slide and surface structure of the deposited material. To better understand the principles of MDD a glass slide is place in a very low pressure environment (approximately 10−4 Pascals) with a large potential difference applied between two electrodes. One of the electrodes consists of a conductive material foil (lead and nickel) which is then deposited onto the glass slide by way of sputtering. Sputtering is a physical vapor deposition method where an inert gas is let into the low pressure environment and a high potential difference is applied. The gas ionizes and results in the acceleration of ions into the conductive foil. The ejected material will then deposit onto the slide. The magnetron creates a magnetic field that concentrates the ionized gas in front of the target which results in more collisions between the ions and foil. It should also result in a more uniform layer of deposited material.
The results are expected to be a mixture of different factors such as the material being sputtered, the time the system operates, the temperature of the system, the potential difference used and the amount of gas allowed in the chamber.
The significance of this work is that the resultant deposited thin film can be used for further research into optical properties of thin films and superconductors and knowing the rate of deposition will mean that further experimentation can be fine-tuned for future research.
Bishop, Danielle, "Magnetron Metal Deposition" (2015). 2015 IPFW Student Research and Creative Endeavor Symposium. 6.